Organizers

Representative

Seiichi MIYAZAKI

Nagoya University

Co-Organizers

Jun XU　

Nanjing University

Sung Woo HWANG
（under negotiation）

Korea University
 

Hitoshi TABATA

The University of Tokyo

Akira SAKAI

Osaka University

Kenji SHIRAISHI

Nagoya University

Correspondence

Kenji SHIRAISHI

Nagoya University（shiraishi@cse.nagoya-u.ac.jp）

Seiichi MIYAZAKI

Nagoya University（miyazaki@nuee.nagoya-u.ac.jp）

Scope

This symposium will focus on surface/interface issues in advanced electron devices including scaled or advanced CMOS devices and will also highlight the progress in the material processing. The sessions will provide a forum for scientists and engineers to exchange information and ideas at the forefront of research on materials and processing toward ultimate integration and device performance. Topics of current interest will be reviewed with several invited talks. Contributions of both experimental and theoretical studied are welcome, especially those that provide a deeper understanding of surface and interface properties and an insight on precise control of material processing for future electron devices.
The sessions will consist of invited and contributed talks, and poster presentations.
Papers are solicited in, but not limited to, the following area:
1 .Characterization of Surfaces and Interfaces
2. Thin Film Growth and Surface Modification
3. Control of Phase Transition
4. Formation and Characterization of Nanostructures
5. Theoretical approaches for materials processing
6. Process and Device Technologies

Topics

1. Characterization of Surfaces and Interfaces
2. Thin Film Growth and Surface Modification
3. Control of Phase Transision
4. Formation and Characterization of Nanostructures
5. Theoretical Approaches for Materials Processing
6. Process and Device Technologies

Keynote Speakers

D.D. SARMA

Indian Institute of Science

Kunji CHEN

Nanjing University

Invited Speakers

Cheol Seong HWANG

Seoul National University

Yoshihito TANAKA

Riken SPring-8 Center

Takashi NAKAYAMA

Chiba University

Hyunsang HWANG

Pohang University of Science & Technology

Kee Joo CHANDNG

Korea Advanced Institute of Science and Technology

Ariando

National University of Singapore

Deren YANG

Zhejiang University