Symposium D-2
Frontier of Nano-Materials Based on Advanced Plasma Technologies
Partly supported by the Japan Society of Applied Physics (JSAP) Kyushu Chapter
Organizers
Representative
- Masaharu SHIRATANI
- Kyushu University
Co-Organizers
- Akihisa OGINO
- Shizuoka University
- Kenji ISHIKAWA
- Nagoya University
- Yasushi INOUE
- Chiba Institute of Technology
- Toshiro KANEKO
- Tohoku University
- Jaeho KIM
- National Institute of Advanced Industrial Science and Technology (AIST)
- Yuichi SETSUHARA
- Osaka University
- Kazuo TERASHIMA
- The University of Tokyo
- Nobuya HAYASHI
- Kyushu University
Correspondence
- Kenji ISHIKAWA
- Nagoya University（ishikawa.kenji@nagoya-u.jp）
- Jaeho KIM
- National Institute of Advanced Industrial Science and Technology (AIST)（jaeho.kim@aist.go.jp）
Scope
Plasma process is a key technology for synthesis of functional nanomaterials, which can evolve into industrial platforms for nanodevice fabrication technologies including bio-inspired nano processes. In addition to a variety of conventional plasma processes, much attention has been paid to novel plasma technologies including tmospheric-pressure non-thermal plasmas, which have been actively studied for applications to surface modifications and ultra-high-rate fabrication of functional nanomaterials. Major objective of this session is to provide an interdisciplinary forum for scientists and engineers in research areas including plasma technologies and nanomaterials to enhance discussions on latest achievements and challenges on the frontier of nanomaterials fabrications based on advanced plasma technologies; characterization and control of subsurface reactions in the advanced plasma processes, synthesis of novel nanomaterials, nanostructure control of materials and novel functionality of nanomaterials.
Topics
- Advanced Plasma Processes for Green Nanotechnologies
- Functional Nanomaterials Fabrications and Nanostructure Control
- Plasma Processes for Energy and Environmental Applications
- Plasma Medicine and Bio-Inspired Nano Processes
- Advanced Plasmas & Surface Diagnostics
- Deposition Processes
- Etching Processes
- Simulation and Database
Keynote Speakers
- Takayuki WATANABE
- Kyushu University
- JeonGeon HAN
- Sungkyunkwan University
Invited Speakers
- Alix GICQUEL
- Laboratoire des Sciences des Procédés et des Matériaux
- Holger KERSTEN
- University of Kiel
- Yi-Kang PU
- Tsinghua University
- Uros CVELBAR
- Jozef Stefan Institute
- Cheng-Che(Jerry) HSU
- National Taiwan University
- HaeJune LEE
- Pusan National University
- SangYul LEE
- Korea Aerospace University
- Dheerawan BOONYAWAN
- Chiang Mai University
- Vladimir SVRCEK
- National Institute of Advanced Industrial Science and Technology
- Daisuke NAGAO
- Tohoku University
- Hiroshi FURUTA
- Kochi University of Technology
- Osamu SAKAI
- Kyoto University
- Takamichi HIRATA
- Tokyo City University
- Kazunori KOGA
- Kyushu University
- Hiroki KONDO
- Nagoya University