Organizers

Representative

Naoto OHTAKE

Tokyo Institute of Technology

Co-Organizers

Haruhiko ITO

Nagaoka University of Technology

Tsuneo SUZUKI

Nagaoka University of Technology

Correspondence

Hiroki AKASAKA

Tokyo Institute of Technology（akasaka@mech.titech.ac.jp）

Scope

Carbon films technology provides an attractive alternative for mechanical components, sensors, semiconductors, actuators, optical components in next generation. In addition to traditional thin films and their coating methods, there are many environmental friendly thin films and deposition systems that have been envisioned and are currently under active research. These include, for example, environmental friendly thin films such as diamond-like carbon, c-BN, a-CN, etc, atmospheric plasma CVD, energy saving deposition process, fabrication of photovoltaic cells, thin films technology for fuel cells and Li ion batteries. All of these require thin films as enabling technology for film design and deposition process with unsurpassed functionality and quality. Environmental Friendly Carbon films and Thin Films Deposition Technology thus presents many challenges and opportunities to researchers from academia and industry alike.

Topics

Specific topics of interest include, but are not limited to:

1. Environmental friendly carbon-based thin films (DLC, c-BN, a-CN,, etc.)
2. Mechanical, tribological, electrical physical and chemical properties of environmental friendly thin films
3. Carbon films technology for fuel cells and Li ion batteries
4. Atmospheric plasma and atmospheric plasma CVD for carbon films fabrication
5. Energy saving deposition process

Invited Speakers

Kwang-Ryeol LEE

KIST

Sponsors

Nanotec Corporation