Symposia & Forums

Symposium D-4
Fabrication of Thin Films

Partly supported by the Japan Society of Applied Physics (JSAP) Kyushu Chapter

Organizers

Representative

Akira IZUMI
Kyushu Institute of Technology

Co-Organizers

Keisuke OHDAIRA
Japan Advanced Institute of Science and Technology (JAIST)
Yong SUN
Kyushu Institute of Technology
Masamichi NAITOH
Kyushu Institute of Technology
Motoi NAKAO
Kyushu Institute of Technology
Kensuke NISHIOKA
Miyazaki University
Akira HEYA
University of Hyogo
Jinn P. Chu
National Taiwan University of Science and Technology

Correspondence

Akira IZUMI
Kyushu Institute of Technology(izumi@ele.kyutech.ac.jp

Scope

The thin film technology is employed in a wide range of applications. Among the various deposition methods, chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes are widely used in industry. However new processes and/or new materials have to be developed to improve the film properties and to enable synthesis of new materials.
This symposium will be focused on, but not restricted to, the current scientific advances in the field of thin-film synthesis based on CVD and PVD processes. The symposium will be an excellent exchange forum for the academic and industrial partners from the thin-film community, and will cover the following hot topics: 1) New deposition processes, including the HWCVD(Cat-CVD), PECVD, MOCVD, APCVD, magnetron sputtering, RTA , sol-gel, etc.; 2) Deposition process modeling and the in situ monitoring during thin-film growth; 3) Deposition of nanostructured films used for mechanical applications: hard coatings, oxidation resistance at high temperature, etc.; 4) Synthesis of thin films for electrical, optical and electro-optic applications,; and 5) Methods of thin-film characterization.

Topics

  1. Novel Methods of Thin-film Fabrication
  2. Modeling of Thin-film Fabrication Processes
  3. Electrical, Optical and Electro-optic Specialized Coatings
  4. High-temperature Oxidation and Wear-resistant Films
  5. Nanostructured Films for Optical and/or Electronic Applications
  6. Novel Methods for Characterization of Thin Films

Invited Speakers

Hitoshi HABUKA
Yokohama National University
Makoto KASU
Saga University